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Artigo Científico | Recobrimentos Protetores | Inglês | 30/09/2002
Autores: J. Damasceno, M. Cremona, S.S. Camargo Jr.
Palavras-chave: chemical vapor deposition, dlc, polycarbonate, silicon carbide, thin films
Resumo: In this work, a-C:H:Si (DLC-Si) films were produced onto crystalline silicon and polycarbonate substrates by the rf-PACVD technique from gaseous mixtures of CH4 + SiH4 and C2H2 + SiH4. The effects of self-bias and gas composition upon mechanical and optical properties of the films were investigated. Micro-hardness, residual stress, surface roughness and refractive index measurements were employed for characterization. By incorporating low concentrations of silicon and by exploring the more favorable conditions for the rf-PACVD deposition technique, highly adherent DLC-Si thin films were produced with reduced internal stresses (lower than 1 GPa), high hardness (around 20 GPa) and high deposition rates (up to 10 µm/h). Results that show the technological viability of this material for application as protective coatings for polycarbonates are also discussed.
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