Atenção
Fechar
Artigo Científico | Eletroquímica | Português | 30/04/1999
Autores: Evaldo José Corat, Koshun Iha, Leide Lili Gonçalves da Silva, Nélia Ferreira Leite, Rita de Cássia Mendes de Barros, Vladimir Jesus Trava-Airoldi
Palavras-chave: boron-doped, chemical vapour deposition, diamond, raman spectroscopy, scanning electron microscopy
Resumo: Boron-doped polycrystalline diamond films have been deposited over silicon substrate by hot-filament chemical-vapor-deposition process. A gas mixture of 0,5 vol. % methane and 1 vol. % methanol on hydrogen at a pressure of 50 Torr, have been used. Boric oxide dissolved in methanol have been used as the boron doping source during the diamond growth process. Raman spectroscopy and Scanning Electron Microscopy (SEM) have been performed on the samples. A change of Raman spectra with film doping was observed. The diamond characteristic line at 1333 cm-1 down shifted and its intensity decreased as the film resistivity decreased. On the other hand, a broad peak around 1220 cm-1 appeared and its intensity increased with decreasing film resistivity. No modifications on films morphology have been observed with different boron doping level. The grains were well-faceted with 2 mm average size
Clique aqui para ler na íntegra
